Baking of photoresist on wafers

Details Baking of photoresist on wafers Baking of photoresist on wafers

1998-10-05

2000-10-24

Walberg, Teresa

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

392416, 118724, 118725, F27B 514

Patent

active

061370886

ABSTRACT:
A method and apparatus for curing a photoresist that is deposited in liquid form and spun on a surface of a wafer leaving a thin film to be cured. This invention teaches methods for curing the resist with improved thickness control using front side heating.

REFERENCES:
patent: 4814243 (1989-03-01), Ziger
patent: 4988284 (1991-01-01), Liu et al.
patent: 5194401 (1993-03-01), Adams et al.
patent: 5306653 (1994-04-01), Hur
patent: 5431700 (1995-07-01), Sloan
patent: 5498292 (1996-03-01), Ozaki
patent: 5870526 (1999-02-01), Aschner et al.

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