Baffled liner cover

Coating apparatus – Gas or vapor deposition

Reexamination Certificate

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Reexamination Certificate

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07736437

ABSTRACT:
A baffled liner cover supported at the top of a liner surrounding a wafer support tower for semiconductor thermal processing. The cover may present a continuous horizontal surface for preventing particles from falling within the liner but present horizontal extending gas passageways in a baffle assembly to allow the flow of processing gas through the cover. In one embodiment, the baffle assembly includes a cup-shaped member disposed in a central aperture of a top plate having an open top, a continuous bottom, horizontal holes through the sides, and a flange around sides defining a convolute annular passage. Alternatively, the planar top plate may included slanted holes therethrough or vertical holes occupying a small fraction of the surface area. The liner and cover may be composed of quartz, silicon carbide, or preferably silicon.

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patent: 2002/0129901 (2002-09-01), Fujikawa et al.
patent: 2004/0129203 (2004-07-01), Zehavi et al.
patent: 2004/0266158 (2004-12-01), Boyle et al.
patent: 2006/0185589 (2006-08-01), Zehavi et al.

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