Baffle plate design for decreasing conductance lost during preci

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118723E, 118723I, 118723MW, 118715, 20429807, C23C 1600

Patent

active

060932813

ABSTRACT:
A baffle plate for semiconductor processing apparatus. The baffle plate includes a plurality of slits. A plurality of fins are located between adjacent slits. The fins have varying heights and a supporting portion interconnects the fins.

REFERENCES:
patent: 3296115 (1967-01-01), Laegreid et al.
patent: 4369730 (1983-01-01), Izu et al.
patent: 4798165 (1989-01-01), deBoer et al.
patent: 4986216 (1991-01-01), Ohmori et al.
patent: 5292396 (1994-03-01), Takashima et al.
patent: 5516367 (1996-05-01), Lei et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Baffle plate design for decreasing conductance lost during preci does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Baffle plate design for decreasing conductance lost during preci, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Baffle plate design for decreasing conductance lost during preci will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1334001

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.