Backside illuminated imaging sensor with backside P + doped...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S082000, C257SE27133, C438S064000, C438S073000

Reexamination Certificate

active

07741666

ABSTRACT:
A backside illuminated imaging sensor includes a semiconductor layer having a P-type region. A frontside and backside P+doped layers are formed within the semiconductor layer. An imaging pixel having a photodiode is formed within the semiconductor layer, where the photodiode is an N−region formed within the P-type region of the semiconductor layer between the frontside P+doped layer and the backside P+doped layer.

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