Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2008-06-17
2010-06-22
Dickey, Thomas L (Department: 2893)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S082000, C257SE27133, C438S064000, C438S073000
Reexamination Certificate
active
07741666
ABSTRACT:
A backside illuminated imaging sensor includes a semiconductor layer having a P-type region. A frontside and backside P+doped layers are formed within the semiconductor layer. An imaging pixel having a photodiode is formed within the semiconductor layer, where the photodiode is an N−region formed within the P-type region of the semiconductor layer between the frontside P+doped layer and the backside P+doped layer.
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Nozaki Hidetoshi
Rhodes Howard E.
Blakely , Sokoloff, Taylor & Zafman LLP
Dickey Thomas L
OmniVision Technologies Inc.
Yushin Nikolay
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