Backside illuminated image sensor

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S451000, C257S455000, C257S460000, C257SE21122, C257SE27015, C257SE27112, C257SE27152, C257SE31084, C257SE31085, C257SE31093

Reexamination Certificate

active

07847326

ABSTRACT:
A backside illuminated image sensor includes a photodiode, formed below the top surface of a semiconductor substrate, for receiving light illuminated from the backside of the semiconductor substrate to generate photoelectric charges, a reflecting gate, formed on the photodiode over the front upper surface of the semiconductor substrate, for reflecting light illuminated from the backside of the substrate and receiving a bias to control a depletion region of the photodiode, and a transfer gate for transferring photoelectric charges from the photodiode to a sensing node of a pixel.

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English Translation of Office Action issued Aug. 14, 2009 in Chinese Patent Application 200810127544.

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