Automatic surface profiling for submicron device

Radiant energy – Inspection of solids or liquids by charged particles – Methods

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

250310, H01J 3700, H01J 3726

Patent

active

055280331

ABSTRACT:
A method for automatically providing a surface profile analysis of a submicron device using a microscope system typically used to measure critical dimensions of the submicron device is disclosed. The method generates a data point array that is linearly interpolated along a particular scan line measured. The system then calculates an angle for performing a rotational correlation then rotates the measurement profile from the scan line to an absolute horizontal position based on this rotational correlation angle. Next, the system separates the scan line into independent subset features having line and trench features. The number of these line and trench features are then determined in the scan line and using the data point array, the system then calculates the height, width, and angle for each subset feature in that scan line.

REFERENCES:
patent: 4525919 (1985-07-01), Fabian
patent: 4596036 (1986-06-01), Norgren et al.
patent: 4693781 (1987-09-01), Leung et al.
patent: 4702795 (1987-10-01), Douglas
patent: 4729815 (1988-03-01), Leung
patent: 4733074 (1988-03-01), Kato et al.
patent: 4900940 (1990-02-01), Nakamura
patent: 4984039 (1991-01-01), Douglas
patent: 5019522 (1991-05-01), Meyer et al.
patent: 5072266 (1991-12-01), Bulucea et al.
patent: 5182234 (1993-01-01), Meyer
patent: 5283442 (1994-02-01), Martin et al.
patent: 5298442 (1994-03-01), Bulucea et al.
patent: 5321977 (1994-06-01), Clabes et al.
patent: 5347854 (1995-09-01), Martin et al.
patent: 5400647 (1995-03-01), Elings
C. Johnson, Jr. et al., "Method for Making Dimensions in Structures Using Sidewall Image Transfer Techniques", IBM Technical Disclosure Bulletin, vol. 26, No. 9, Feb. 1984, pp. 4587-4589.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Automatic surface profiling for submicron device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Automatic surface profiling for submicron device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Automatic surface profiling for submicron device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-224638

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.