Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1997-05-14
1998-12-01
Mottola, Steven
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511131, 333 171, H05H 124
Patent
active
058443690
ABSTRACT:
A phase adjusting circuit for adjusting phases of output powers from two high frequency power generators in a plasma processing apparatus comprises first and second synthesizing circuits for generating first and second high frequency signals of a predetermined waveform with frequencies of f0 and f0.+-..DELTA.f (.DELTA.f<<f0), a phase difference detection circuit for detecting a phase difference between detection signals of plate electrodes, a third waveform synthesizing circuit for generating a high frequency signal with frequency and waveform same as the first frequency signal which has a phase determined from a phase error between a set phase difference and an output from the phase difference detection circuit and a phase adjusting circuit which determines output powers of the two high frequency power generators base on outputs of the first and third waveform synthesizing circuits.
REFERENCES:
patent: 4871421 (1989-10-01), Ogle et al.
patent: 5228939 (1993-07-01), Chu
patent: 5576629 (1996-11-01), Turner et al.
Ito Tsuneo
Nakamoto Akie
Yoshizako Yuji
Bettendorf Justin P.
Daihen Corporation
Mottola Steven
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