1977-03-31
1979-05-08
Evans, F. L.
G02B 711
Patent
active
041533410
ABSTRACT:
This invention relates to an automatic focusing apparatus, in that a position of a substrate mounted on the base of the apparatus is detected as a pressure value by a first detecting means, such as an air micrometer, in that second detecting means, such as an air micrometer, are provided on a portion of the apparatus to determine a reference pressure, gas supplied into the second detecting means is derived from the same supply source as that of the first detecting means, and further, in that the base can be controlled and moved until the difference between the reference pressure and the detected pressure reaches a predetermined constant value, whereby the surface of the sample can be automatically positioned at a desired focusing position.
REFERENCES:
patent: 3511149 (1970-05-01), Blattner et al.
patent: 3519334 (1970-07-01), Heitmann et al.
patent: 3704657 (1972-12-01), Sliwkowski et al.
patent: 3984678 (1976-10-01), Uchiyama et al.
Kawamura Yoshio
Moriyama Shigeo
Evans F. L.
Hitachi , Ltd.
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