Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2006-06-20
2006-06-20
Chawan, Sheela (Department: 2623)
Image analysis
Applications
Manufacturing or product inspection
C382S149000, C382S168000, C356S237400, C250S559220
Reexamination Certificate
active
07065239
ABSTRACT:
A method and system for defect inspection of microfabricated structures such as semiconductor wafers, masks or reticles for micro-fabrication, flat panel displays, micro-electro-mechanical (MEMs) having repetitive array regions such as memories or pixels. In one embodiment a method of inspection of microfabricated structures includes the steps of acquiring contrast data or images from the microfabricated structures, analyzing automatically the contrast data or images to find repetitive regions of the contrast data and comparing the repetitive regions of the contrast data with reference data to detect defects in the microfabricated structures. In the analyzing step, a cell-metric such as the range, or mean or other statistical or mathematical measure of the contrast data is used to find the repetitive regions. Image or contrast data acquisition can be performed with an optical, e-beam or other microscope suited for microfabricated structures.
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Barnard Richard
Gallarda, Jr. Harry Stanton
Liu Jun
Maayah Kais Jameel
Srinivasan Lakshman
Applied Materials Inc.
Chawan Sheela
Fahmi Tarek N.
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