Data processing: measuring – calibrating – or testing – Measurement system – Remote supervisory monitoring
Reexamination Certificate
2007-09-21
2009-12-22
Cosimano, Edward R (Department: 2863)
Data processing: measuring, calibrating, or testing
Measurement system
Remote supervisory monitoring
C250S306000, C250S307000, C250S492100, C250S492200, C356S237100, C356S237200, C356S237300, C356S237400, C356S237500, C356S237600, C356S337000, C382S100000, C382S141000, C382S145000, C382S147000, C382S149000, C378S001000, C378S070000, C378S086000, C438S014000, C438S016000, C700S090000, C700S095000, C700S117000, C700S121000, C702S001000, C702S033000, C702S035000, C702S036000, C702S040000, C702S081000, C702S187000, C702S189000
Reexamination Certificate
active
07636649
ABSTRACT:
An optical metrology model for the structure is obtained. The optical metrology model comprising one or more profile parameters, one or more process parameters, and a dispersion. A dispersion function that relates the dispersion to at least one of the one or more process parameters is obtained. A simulated diffraction signal is generated using the optical metrology model and a value for the at least one of the process parameters and a value for the dispersion. The value for the dispersion is calculated using the value for the at least one of the process parameter and the dispersion function. A measured diffraction signal of the structure is obtained using an optical metrology tool. The measured diffraction signal is compared to the simulated diffraction signal to determine one or more profile parameters of the structure. The fabrication tool is controlled based on the determined one or more profile parameters of the structure.
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Chu Hanyou
Li Shifang
Madriaga Manuel
Cosimano Edward R
Madriaga Manuel B.
Tokyo Electron Limited
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