Image analysis – Applications – Manufacturing or product inspection
Patent
1996-10-09
2000-04-18
Couso, Yon J.
Image analysis
Applications
Manufacturing or product inspection
382149, G06K 900
Patent
active
060524782
ABSTRACT:
An automated photomask inspection apparatus including an XY state (12) for transporting a substrate (14) under test in a serpentine path in an XY plane, an optical system (16) comprising a laser (30), a transmission light detector (34), a reflected light detector (36), optical elements defining reference beam paths and illuminating beam paths between the laser, the substrate and the detectors and an acousto-optical beam scanner (40, 42) for reciprocatingly scanning the illuminating and reference beams relative to the substrate surface, and an electronic control, analysis and display system for controlling the operation of the stage and optical system and for interpreting and storing the signals output by the detectors. The apparatus can operate in a die-to-die comparison mode or a die-to-database mode.
REFERENCES:
patent: 3851951 (1974-12-01), Eveleth
patent: 4247203 (1981-01-01), Levy et al.
patent: 4500202 (1985-02-01), Smyth
patent: 4549206 (1985-10-01), Suzuki et al.
patent: 4579455 (1986-04-01), Levy et al.
patent: 4633504 (1986-12-01), Wihl
patent: 4644172 (1987-02-01), Sandland et al.
patent: 4669885 (1987-06-01), Ina
patent: 4778984 (1988-10-01), Nakamura
patent: 4805123 (1989-02-01), Specht et al.
patent: 4908871 (1990-03-01), Hara et al.
patent: 4910690 (1990-03-01), Fujita
patent: 4916340 (1990-04-01), Negishi
patent: 4926081 (1990-05-01), Yamamoto et al.
patent: 4926489 (1990-05-01), Danielson et al.
patent: 4969200 (1990-11-01), Manns et al.
patent: 5008851 (1991-04-01), Brandstetter et al.
patent: 5048967 (1991-09-01), Suzuki et al.
patent: 5098191 (1992-03-01), Noguchi et al.
patent: 5133601 (1992-07-01), Cohen et al.
patent: 5231621 (1993-07-01), Matsui et al.
patent: 5311598 (1994-05-01), Bose et al.
patent: 5572598 (1996-11-01), Wihl et al.
Fein Michael E.
Fu Tao-Yi
Kvamme Damon Floyd
Wihl Mark Joseph
Zywno Marek
Couso Yon J.
Kla-Tencor Corporation
LandOfFree
Automated photomask inspection apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Automated photomask inspection apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Automated photomask inspection apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2342937