Automated metrology recipe generation

Details Automated metrology recipe generation Automated metrology recipe generation

2005-12-30

2009-12-08

Rossoshek, Helen (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000, C716S030000, C716S030000, C438S014000

Reexamination Certificate

active

07631286

ABSTRACT:
A method, system and encoded computer instructions provide for automatic generation of a metrology recipe without referencing a wafer. The highly accurate metrology recipe provides for locating measurement locations corresponding to test features on the wafer and directing the metrology tool to the locations, by calculating coordinates for the measurement locations based on mask data, lithography tool data, CAD data and process data. The metrology recipe directs the metrology tool to within 10 microns of test features formed on the wafer. Criteria may be input to a data base to identify multiple existing recipes and the automatically generated recipe may be generated to replace each identified recipe.

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