Automated focusing of electron image

Details Automated focusing of electron image Automated focusing of electron image

2006-05-09

2006-05-09

Wells, Nikita (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

C324S754120

Reexamination Certificate

active

07041976

ABSTRACT:
One embodiment disclosed relates to a method for automated focusing of an electron image. An EF cut-off voltage is determined. In compensation for a change in the EF cut-off voltage, a focusing condition is adjusted. Adjusting the focusing condition may comprise, for example, adjusting a wafer bias voltage in correspondence to the change in cut-off voltage. Another embodiment disclosed relates to a method for automated focusing of an electron image in a scanning electron imaging apparatus. A focusing condition of a primary electron beam in a first image plane is varied so as to maximize an intensity of a secondary electron beam through an aperture in a second image plane.

REFERENCES:
patent: 5404012 (1995-04-01), Yamada
patent: 6548810 (2003-04-01), Zaluzec
patent: 6566897 (2003-05-01), Lo et al.
patent: 6683320 (2004-01-01), Gerlach et al.

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