Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1999-02-19
2000-10-31
Bettendorf, Justin P.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
20419213, 20419233, H05H 124
Patent
active
061407739
ABSTRACT:
An apparatus and method for controlling an array of constricted glow discharge chambers are disclosed. More particularly a linear array of constricted glow plasma sources whose polarity and geometry are set so that the contamination and energy of the ions discharged from the sources are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a plasma with contamination below practical detection limits. The quality of film along deposition "tracks" opposite the plasma sources can be measured and compared to desired absolute or relative values by optical and/or electrical sensors. Plasma quality can then be adjusted by adjusting the power current values, gas feed pressure/flow, gas mixtures or a combination of some or all of these to improve the match between the measured values and the desired values.
REFERENCES:
patent: 5580429 (1996-12-01), Chan et al.
patent: 5614248 (1997-03-01), Schiller et al.
patent: 5653811 (1997-08-01), Chan
Anders, A., et al; "Hollow-anode plasma source for molecular beam epitaxy of gallium nitride",. Rev. Sci. Instrum. 67 (3), Mar. 1996, pp. 905-907.
Anders, A., and Anders, S.; "The working principle of the hollow-anode plasma source"; Plasma Sources Sci. Technol. 4 (1995); pp. 571-575.
Miljevic, V. I.; "Some Characteristics of the hollow-anode ion source"; Rev. Sci. Instrum. 63 (4); Apr. 1992; pp. 2619-2620.
Miljevic, V. I.; "Hollow anode ion source"; Rev. Sci. Instrum. 61 (1), Jan. 1990; pp. 312-314.
Miljevic, V.; "Hollow anode ion-electron source"; Rev. Sci. Instrum. 55 (6), Jun. 1984; pp. 931-933.
Miljevic, V. I.; "Spectroscopy of hollow anode discharge"; Applied Optics, vol. 23, No. 10, May 15, 1984; pp. 1598-1600.
Anders Andre
Maschwitz Peter A.
Bettendorf Justin P.
Biksa Janis
CRFilms Inc.
Sartorio Henry P.
The Regents of the University of California
LandOfFree
Automated control of linear constricted plasma source array does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Automated control of linear constricted plasma source array, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Automated control of linear constricted plasma source array will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2055903