Attenuated phase-shifted reticle using sub-resolution pattern

Details Attenuated phase-shifted reticle using sub-resolution pattern Attenuated phase-shifted reticle using sub-resolution pattern

1992-09-25

1999-03-09

Metjahic, Safet

X-ray or gamma ray systems or devices

Specific application

Lithography

2504922, G03F 720, B05D 306

Patent

active

058811257

ABSTRACT:
An attenuated phase-shifted reticle. The disclosed reticle comprises a sub-resolution pattern, in regions other than the features to be formed. The sub-resolution pattern transmits a substantially uniform, attenuated radiation intensity. The features are phase-shifted relative to the sub-resolution pattern, such that light transmitted through them is approximately 180.degree. out of phase compared with the attenuated radiation transmitted through the sub-resolution pattern surrounding the features. In this way, the sub-resolution pattern acts as a phase-shifter for the features.

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patent: 4881257 (1989-11-01), Nakagawa
patent: 4890309 (1989-12-01), Smith et al.
patent: 5049925 (1991-09-01), Aiton et al.
patent: 5135609 (1992-08-01), Pease et al.
patent: 5503959 (1996-04-01), Langston
Lin, Burn J. "The Attenuated Phase-Shifting Mask" Solid State Technology Jan. 1992 p. 43, pp. 45-47.
N. Hasegawa, A. Imai, T. Terasawa, T. Tanaka, F. Murai. The Japan Society of Applied Physics and Related Societies "Extended Abstracts 29p-ZC-3, Submicron Lithography Using Phase Mask (9): Halftone Phase Shifting Mask"1991.

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