Atomisation of a precursor into an excitation medium for...

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07968154

ABSTRACT:
The invention relates to a method and apparatus for applying and forming a coating on a substrate surface by the application of at least one atomized coating forming material onto the substrate to form the coating. The atomized coating forming material, upon leaving a suitable atomizer which can be an ultrasonic nozzle or nebulizer for example, passes through an exciting medium and, upon leaving the exciting medium, passes to the substrate. The substrate is positioned remotely from the exciting medium.

REFERENCES:
patent: 4603030 (1986-07-01), McCarthy
patent: 4629604 (1986-12-01), Spector
patent: 4693799 (1987-09-01), Yanagihara et al.
patent: 4824690 (1989-04-01), Heinecke et al.
patent: 4952024 (1990-08-01), Gale
patent: 5105761 (1992-04-01), Charlet et al.
patent: 5260105 (1993-11-01), Wang
patent: 5366770 (1994-11-01), Wang
patent: 5412246 (1995-05-01), Dobuzinsky et al.
patent: 5591409 (1997-01-01), Watkins
patent: 5609921 (1997-03-01), Githofer et al.
patent: 5876753 (1999-03-01), Timmons et al.
patent: 6012647 (2000-01-01), Ruta et al.
patent: 6146503 (2000-11-01), Sindzingre et al.
patent: 6174651 (2001-01-01), Thakur
patent: 6245396 (2001-06-01), Nogami
patent: 6287643 (2001-09-01), Powell et al.
patent: 6305314 (2001-10-01), Sneh et al.
patent: 6402126 (2002-06-01), Vaartstra et al.
patent: 6427623 (2002-08-01), Ko
patent: 6893978 (2005-05-01), Kula
patent: 2002/0004104 (2002-01-01), Timmons et al.
patent: 2002/0036358 (2002-03-01), Watkins
patent: 2004/0022945 (2004-02-01), Goodwin et al.
patent: 0431951 (1990-07-01), None
patent: 0 704 552 (1996-03-01), None
patent: 0896935 (1999-02-01), None
patent: 10250195 (2000-03-01), None
patent: 9858117 (1998-12-01), None
patent: WO 98/58117 (1998-12-01), None
patent: 9940758 (1999-08-01), None
patent: 0005000 (2000-02-01), None
patent: PCT/US00/12821 (2000-11-01), None
patent: 0228548 (2002-04-01), None
patent: 0228548 (2002-04-01), None
patent: WO 02/28548 (2002-04-01), None
patent: 03097245 (2003-11-01), None
Bailey, The generation and measurement of aerosols, Journal of Material Science 9, 1974, p. 1344-1362.
Office Action for U.S. Appl. No. 10/516,448 dated May 16, 2005.
Brockhaus et al., “Diagnostics of a Chemically Active, Pulsed Microwave Plasma for Deposition of Quartz-like Films,” Contrib. Plasma Phys. 39 (1999) 5, 399-409.
Grill, Alfred, “Cold Plasma in Materials Fabrication: from Fundamentals to Applications,” IEEE Press, Apr. 1994.
Kanazawa et al., “Stable Glow Plasma at Atmospheric Pressure,” J. Phys. D: Appl. Phys. 21 (1988), 838-840.
Kanazawa et al., “Glow Plasma Treatment at Atmospheric Pressure for Surface Modification and Film Deposition,” Nuclear Instruments and Methods in Physics Research B37/38 (1989), 842-845.
Yokoyama et al., “The Improvement of the Atmospheric-Pressure Glow Plasma Method and the Deposition of Organic Films,” J. Phys. D: Appl. Phys. 23 (1990), 374-377.
Final Office Action for U.S. Appl. No. 10/516,448 dated Jan. 29, 2010.
Klages, Claus-Peter et al., “Surface Functionalization at Atmospheric Pressure by DBD-Based Pulsed Plasma Polymerization,” Plasma and Polymers, vol. 5, No. 2, Nov. 24, 2000, pp. 79-89.
Badyal, J.P.S., “Controlled Plasma Chemical Deposition of Polymeric Coatings,” Institution of Electrical Engineers, 1999.
Hynes, A.M., et al., “Pulsed Plasma Polymerization of Perfluorocyclohexane,” Macromolecules, vol. 29, No. 12, 1996, pp. 4220-4225.
Hynes, A., et al., “Selective Incorporation of Perfluorinated Phenyl Rings During Pulsed Plasma Polymerization of Perfluoroallybenzene,” Chem.Mater., vol. 10, No. 8, 1998, pp. 2177-2182.
Office Action from U.S. Appl. No. 10/516,448 dated Oct. 7, 2010.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Atomisation of a precursor into an excitation medium for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Atomisation of a precursor into an excitation medium for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Atomisation of a precursor into an excitation medium for... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2648331

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.