Atomic layer deposition of tantalum-containing films using...

Details Atomic layer deposition of tantalum-containing films using... Atomic layer deposition of tantalum-containing films using...

2006-08-01

2010-06-15

Meeks, Timothy H (Department: 1792)

Coating processes

Coating by vapor, gas, or smoke

C556S042000, C556S043000

Reexamination Certificate

active

07736697

ABSTRACT:
Atomic layer deposition processes for the formation of tantalum-containing films on surfaces are provided. Also provided are novel tantalum complexes that can be used as tantalum precursors in the disclosed deposition processes.

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