Atomic layer deposition method

Details Atomic layer deposition method Atomic layer deposition method

2005-03-29

2005-03-29

Chen, Bret (Department: 1762)

Coating processes

Coating by vapor, gas, or smoke

C427S255500, C427S569000

Reexamination Certificate

active

06872421

ABSTRACT:
An apparatus and method for performing atomic layer deposition. A plurality of substrates are loaded into a plurality of reaction cells. The reaction cells are disposed in a reaction chamber isolated from an exterior condition. Various paper substances are ultimately and repeatedly applied onto each substrate such that a thin film is formed on each substrate. The plurality of vapor injection pipes each inject one of the vapor substances by periodically scanning over each substrate to apply substance.

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