Atomic layer deposition apparatus

Details Atomic layer deposition apparatus Atomic layer deposition apparatus

2011-07-12

2011-07-12

Turocy, David (Department: 1715)

Coating processes

Coating by vapor, gas, or smoke

Plural coatings applied by vapor, gas, or smoke

C427S255270, C427S248100

Reexamination Certificate

active

07976898

ABSTRACT:
The present invention relates to an ALD apparatus, and particularly relates to an ALD apparatus that is suitable for rapidly depositing a thin film on a substrate having an actual area that is larger than a planar substrate. In the reaction chamber of the ALD apparatus according to an exemplary embodiment of the present invention, more gas is supplied to a portion where more gas is required by having differences in the space for gas to flow rather than supplying the gas in a constant flux and a constant flow velocity such that the time required for supplying reactant gases and waste of reactant gases may be minimized to increase productivity of the ALD apparatus. The ceiling of the reaction space is shaped to provide a nonuniform gap over the substrate.

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