Atmospheric pressure plasma reaction method of forming a hydroph

Details Atmospheric pressure plasma reaction method of forming a hydroph Atmospheric pressure plasma reaction method of forming a hydroph

1995-03-09

1998-03-31

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427578, 427579, 4272556, B05D 306

Patent

active

057336105

ABSTRACT:
A plasma reaction method is conducted at atmospheric pressure and is used to treat a surface of a substrate with a reactive plasma. The reaction method involves introducing a mixture of helium and a reactant (monomer) gas into a reaction vessel having upper and lower electrodes. In a preferred embodiment the upper electrode is provided with grooves for diffusing the plasma uniformly over the surface of the electrode. The helium and reactant gas mixture is excited at atmospheric pressure to produce a stable glow discharge plasma which reacts with the surface of the substrate. The preferred gas mixture has helium present at greater than 90% and uses ethylene or tetrafluoromethane as a reactant component.

REFERENCES:
patent: 4223048 (1980-09-01), Engle
patent: 4616597 (1986-10-01), Kaganowicz
patent: 4767641 (1988-08-01), Kieser et al.
patent: 5031571 (1991-07-01), Igarashi et al.
patent: 5041304 (1991-08-01), Kusano et al.
patent: 5124173 (1992-06-01), Uchiyama et al.

Affiliated with

Also associated with

Rating

Atmospheric pressure plasma reaction method of forming a hydroph does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Atmospheric pressure plasma reaction method of forming a hydroph, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Atmospheric pressure plasma reaction method of forming a hydroph will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-49669