Atmospheric pressure plasma processing method and apparatus

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With heating or cooling means for apparatus part other than...

Reexamination Certificate

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C156S345480, C204S298360, C204S298090, C118S7230AN

Reexamination Certificate

active

07056416

ABSTRACT:
Provided is a plasma processing method for generating microplasma in a space of a microplasma source arranged in the vicinity of an object to be processed by supplying gas to the space and supplying electric power to a member located in the vicinity of the space, making activated particles emitted from an opening of the microplasma source joined to the space act on the object, and forming a fine linear portion on the object. The fine linear portion is formed on the object while flowing the gas to the neighborhood of the opening along the lengthwise direction of the fine linear portion parallel to the object.

REFERENCES:
patent: 5019117 (1991-05-01), Nakamura et al.
patent: 5182495 (1993-01-01), Fukuda et al.
patent: 5211825 (1993-05-01), Saito et al.
patent: 5234526 (1993-08-01), Chen et al.
patent: 5336355 (1994-08-01), Zarowin et al.
patent: 9-27482 (1997-01-01), None
patent: 2000-164395 (2000-06-01), None
patent: 0115496 (1997-01-01), None

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