Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1991-06-11
1992-06-16
Laroche, Eugene R.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
356312, 356316, 31323131, 250425, H05H 124
Patent
active
051227134
ABSTRACT:
This invention pertains to an atmospheric pressure capacitively coupled plasma formed inside a graphite furnace as a source for atomic emission spectroscopy. A capacitively coupled plasma device includes an electrically conducting, hollow elongated tube and an electrically conducting rod located coaxially and substantially inside the elongated tube, an ionizable gas present inside the cylindrical tube, and a mechanism of applying a high-frequency electric potential between the tube and the rod.
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Blades Michael W.
Liang Dong C.
LaRoche Eugene R.
University of British Columbia
Yoo D. Hyum
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