Atmospheric pressure capacitively coupled plasma atomizer for at

Details Atmospheric pressure capacitively coupled plasma atomizer for at Atmospheric pressure capacitively coupled plasma atomizer for at

1989-07-11

1992-01-14

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31323138, 356311, 356316, 250425, H01J 4904

Patent

active

050813978

ABSTRACT:
A novel atmospheric pressure capacitively coupled ratio frequency plasma discharge method and apparatus. The apparatus is suitable for atomic absorption and atomic emission analysis of discrete sample volumes (1-50 .mu.l). The plasma can be operated at very low Radio Frequency (RF) input powers (10-600 W) which allow for optimal conditions for atom resonance line absorption measurements. Sample vaporization for analysis in the plasma is done by an electrically heated tantalum strip vaporizer. The vaporization and dissociation-atomization steps are separately controlled. Analyte absorption takes place in the plasma discharge which is characterized by a long path length (10-50 cm) and low support gas flow rate (0.05 to 6 L/m) both of which provide for a relatively long residence time. The device exhibits linear calibration plots and provides sensitivities in the range of from 3.5-40 pg.

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