Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1997-03-12
1999-09-07
Nguyen, Nam
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
G03F 900
Patent
active
059485710
ABSTRACT:
A photo mask and a method for using the photo mask to make asymmetric resist patterns are provided. A wafer having a resist coating thereon is exposed using the mask of the invention under specially controlled defocus conditions to provide the asymmetric resist pattern profile. The mask which comprises phase shifter means on one or both sides of a light shielding pattern forming material on the mask provides light passing through the mask having a different phase on each side of the light shielding material which produces an asymmetric resist pattern profile.
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Brunner Timothy Allan
Mih Rebecca Dora
Wheeler Donald Coughlin
International Business Machines - Corporation
Nguyen Nam
Tomaszewski John J.
Townsend Tiffany L.
VerSteeg Steven H.
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