Asymmetrical focus ring

Details Asymmetrical focus ring Asymmetrical focus ring

2005-11-08

2005-11-08

Paschall, Mark (Department: 3742)

Electric heating

Metal heating

By arc

C219S121480, C156S345420, C118S7230AN

Reexamination Certificate

active

06963043

ABSTRACT:
An asymmetrical focus ring varies the flow-field, which aids in normalizing pressure gradients across the wafer being processed, thereby improving the process. Embodiments of the present invention utilize a focus ring that either (1) contains a pattern of through holes that enhances pumping, or (2) does not contain any such pattern.

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patent: 2003/0201069 (2003-10-01), Johnson
patent: 2003/0227258 (2003-12-01), Strang et al.
patent: 2004/0074605 (2004-04-01), Nezu et al.

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