Magnetoresistance effect element, its manufacturing method,...

Dynamic magnetic information storage or retrieval – Head – Magnetoresistive reproducing head

Reexamination Certificate

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C360S324200, C428S611000, C428S678000, C428S686000, C428S692100, C428S693100

Reexamination Certificate

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06937447

ABSTRACT:
A magnetoresistance effect element includes a first ferromagnetic layer, insulating layer overlying the first ferromagnetic layer, and second ferromagnetic layer overlying the insulating layer. The insulating layer has formed a through hole having an opening width not larger than 20 nm, and the first and second ferromagnetic layers are connected to each other via the through hole.

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JPO Abstract of JP 2001-143227.
N. Garcia, et al., “Magnetoresistance in Excess of 200% in Ballistic Ni Nanocontacts at Room Temperature and 100 Oe,” Physical Review Letters, vol. 82, No. 14, Apr. 5, 1999, pp. 2923-2926.
J. J. Versluijs, et al., “Magnetoresistance of Half-Metallic Oxide Nanocontacts,” Physical Review Letters, vol. 87, No. 2, Jul. 9, 2001, pp. 026601-1 through 026601-4.

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