Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2005-01-04
2005-01-04
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298120, C204S198001, C204S298200, C204S298210
Reexamination Certificate
active
06837975
ABSTRACT:
A magnetron system for a sputtering target having an annular vault facing the wafer to be coated and having inner and outer sidewalls and a roof. A small magnetron is positioned over the roof. A first magnet assembly having a first magnet polarity along the target axis is positioned behind the inner sidewall. A second magnet assembly having an opposed second opposed magnetic polarity is disposed in back of the outer sidewall and has magnetic strength much greater than the first magnet assembly but its strength is asymmetrically distributed about the target axis. The second magnet assembly and the roof assembly are rotated together about the target axis. The rotating asymmetric sidewall magnet assembly may also be used with a hollow-cathode target, with or without a roof magnetron.
REFERENCES:
patent: 5417833 (1995-05-01), Harra et al.
patent: 5660744 (1997-08-01), Sekine et al.
patent: 6217716 (2001-04-01), Lai
patent: 6251242 (2001-06-01), Fu et al.
patent: 6277249 (2001-08-01), Gopalraja et al.
patent: 6352629 (2002-03-01), Wang
patent: 6406599 (2002-06-01), Subramani et al.
patent: 6436251 (2002-08-01), Gopalraja et al.
patent: 6444104 (2002-09-01), Gopalraja et al.
patent: 6451177 (2002-09-01), Gopalraja et al.
patent: 6485617 (2002-11-01), Fu et al.
patent: 6485618 (2002-11-01), Gopalraja et al.
patent: 1119017 (2001-07-01), None
Gopalraja Praburam
Wang Wei D.
Applied Materials Inc.
Guenzer Charles S.
McDonald Rodney G.
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