Ashing method

Details Ashing method Ashing method

1998-03-13

2000-03-28

Gibson, Sharon

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Removal of imaged layers

438715, 438725, 438726, G03F 736

Patent

active

060430044

ABSTRACT:
The ashing method comprises the steps of forming resist on a part of an underlying layer, ion-implanting elements into the underlying layer and the resist, placing the resist in radical atmosphere including oxygen radical and then ashing an upper layer portion which includes the impurity elements and is formed an a surface of the resist, and ashing remaining portion of the resist by increasing an amount of the oxygen radical in the radical atmosphere.

REFERENCES:
patent: 4511430 (1985-04-01), Chen
patent: 5226056 (1993-07-01), Kikuchi et al.
patent: 5503964 (1996-04-01), Nishina
patent: 5795831 (1998-08-01), Nakayama et al.
patent: 5811358 (1998-09-01), Tseng

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