Article holders that use gas vortices to hold an article in...

Details Article holders that use gas vortices to hold an article in... Article holders that use gas vortices to hold an article in...

2005-05-31

2005-05-31

Mills, Gregory (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With workpiece support

C156S345510, C156S345540, C156S345550, C118S724000, C118S728000, C118S729000, C118S730000, C118S731000, C204S298010, C269S020000, C062S404000

Reexamination Certificate

active

06899788

ABSTRACT:
An article (e.g. a semiconductor wafer) is held in an article holder by means of a number of gas flows emitted from gas vortex chambers. Some of the gas flows act to cool an adjacent article portion more than the other gas flows. For example, some of the vortex chambers emit more gas per unit of time than the other chambers. More cooling is provided to those portions of the article which are heated more during processing. Greater temperature uniformity can be achieved.

REFERENCES:
patent: 6168697 (2001-01-01), Siniaguine et al.
patent: 97/45862 (1997-12-01), None
patent: 00/70659 (2000-11-01), None

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