Arrangement and method for fabricating a semiconductor wafer

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means

Reexamination Certificate

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C438S689000, C438S690000, C216S037000, C216S074000, C216S079000, C216S088000, C216S089000

Reexamination Certificate

active

07601643

ABSTRACT:
An arrangement and method for fabricating a semiconductor wafer which utilizes a nonaqueous solvent rinse is disclosed.

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