Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-12-18
2000-03-21
Mullis, Jeffrey C.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
525450, 528206, C08G 6102, C08F 600
Patent
active
060401117
ABSTRACT:
Disclosed are an aromatic hydroxycarboxylic acid resin represented by the following formula (1): ##STR1## wherein each A group is the same or different and individually represents a substituted or unsubstituted phenylene or naphthylene group, R.sup.1 represents a hydrogen atom or a C.sub.1-4 alkyl group, R.sup.2 represents a hydrogen atom or a C.sub.1-10 alkyl, C.sub.1-10 alkoxyl, nitro or hydroxyl group, l stands for an integer of 0-100, m stands for an integer of 0-20 and n stands for an integer of 0-3 with the proviso that m stands for an integer other than 0 when all of the A group represent an unsubstituted or substituted phenylene group, a preparation process thereof and use of the same.
REFERENCES:
patent: 4642282 (1987-02-01), Stahlhofen
patent: 4879368 (1989-11-01), Botta et al.
DeGeiso et al, Journal of Organic Chemistry, "Polymeric Ligands. I. Some Salicyclic Acid Derivatives", vol. 27, pp. 1424-1426 (1962).
Patel et al, J. Macromol. Sci.-Chem., "Friedel-Crafts Polymers. 8. Friedel-Crafts Polycondensation of .beta.-Resorcylic Acid or Resorcinol with p-Xylylene Dichloride, p,p'-Dichloromethyldiphenyl Ether, and p,p'-Dichloroacetyldiphenyl Ether", A23(10), pp. 1251-1261 (1986).
Ishihara Yuko
Karasawa Akio
Yamaguchi Akihiro
Yamaguchi Keizaburo
Mitsui Chemicals Inc.
Mullis Jeffrey C.
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