Arc discharge plasma CVD method for forming diamond-like carbon

Details Arc discharge plasma CVD method for forming diamond-like carbon Arc discharge plasma CVD method for forming diamond-like carbon

1994-10-18

1997-11-25

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427580, 427249, 4272555, 427122, B05D 306, C23C 1626, H05H 148

Patent

active

056910100

ABSTRACT:
A method of forming a diamond-like carbon film on a substrate arranged in a vacuum chamber includes the steps of generating an arc-discharge plasma current in the vacuum chamber, supplying a reaction gas containing carbon atoms, such as CH.sub.4 gas for example, into the arc-discharge plasma current, applying a high-frequency voltage to the substrate so that a self-bias developed in the substrate is not more than -200 V, and forming a diamond-like carbon film from the reaction gas on the substrate that is supplied with the high-frequency voltage.

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