Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1994-11-14
1995-12-26
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
118 501, 118500, 118623, 118728, 427249, 4272552, 427577, 427580, 427585, 427598, B05D 306
Patent
active
054786088
ABSTRACT:
An improved vacuum arc coating apparatus is provided, having a reaction zone with a plasma channel defined within a series of aligned annular substrate holders, or between an outer wall of a chain of substrate holder blocks and the inner wall of the tube. The substrate holders thus act as a liner, confining an arc within the plasma channel. Carrier and plasma creating gases and the reaction species are introduced into the tube, and the deposition process may be carried out at a pressure between 10 Torr and 1000 Torr. Magnetic coils may be used to create a longitudinal magnetic field which focuses the plasma column created by the arc, and to create a transverse magnetic field which is used to bias the plasma column toward the substrates. Substrates can thus be placed anywhere within the reaction zone, and the transverse magnetic field can be used to direct the plasma column toward the substrate, or the tube itself can be rotated to pass the substrate through the plasma column.
REFERENCES:
patent: 4471003 (1984-09-01), Cann
patent: 4471004 (1984-09-01), Kim
patent: 4487161 (1984-12-01), Hirata et al.
patent: 4487162 (1984-12-01), Cann
patent: 4487163 (1984-12-01), Jobert et al.
patent: 4555611 (1985-11-01), Moll
patent: 4682564 (1987-07-01), Cann
patent: 4682565 (1987-07-01), Carrico
patent: 4725447 (1988-02-01), Pfender
"The Growth of Diamond Films Using a DC-Biased Hot Filament Technique", Hou Li, et al., New Diamond Science and Technology 1991 MRS. Int. Conf. Proc., (no month available).
"Surface Morphologies and Photoluminescence of Diamond Films Deposited in a Hot Filament Reactor", T. Srivinyunon, et al., New Diamond Science and Technology 1991 MRS Int. Conf. Proc., (no month available).
"Thermal diffusivity of diamond films synthesized from methane by arc discharge plasma jet CVD", Boudina et al., Diamond and Related Materials, 2 (1993) 852-8, (no month available).
"Diamond deposition from an Ar-CCl.sub.4 -H.sub.2 plasma jet at 13.3 kPa", Kotaki et al., Diamond and Related Materials, 2 (1993) 324-46, (no month available).
"Plasma-assisted CVD of diamond films by hollow cathode arc discharge", Stiegler et al., Diamond and Related Materials, 2 (1993) 413-16, (no month available).
"Novel Synthesis Routes for Diamond Films in a Heated Flowtube", L. R. Martin et al., New Diamond Science and Technology 1991 MRS Int. Conf Proc., (no month available).
"Thermochemical vapor deposition of diamond in a carbon-halogen-oxygen and/or sulfur atmospheric hot wall reactor", D. E. Patterson et al., Applications of Diamond Films and Related Materials, Tzeng et al., 1991, (no month available).
Carbon Deposition Using an Expanded Cascaded Arc DC Plasma, J. J. Beulene et al., Surface and Coatings Technology, 47(1991)401-417, published 1991, (no month available).
Eisen Mark B.
Pianalto Bernard
LandOfFree
Arc assisted CVD coating method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Arc assisted CVD coating method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Arc assisted CVD coating method and apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1367669