Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1995-08-24
1996-12-24
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
118 50, 118719, 118721, 118723E, 118723MA, 118723MW, 118723VE, 427212, 427249, 4272552, 427294, 427575, 427577, 427580, 427585, H05H 102
Patent
active
055872077
ABSTRACT:
An improved vacuum arc coating apparatus is provided, having a tube defining reaction zone with a plasma channel defined within a series of aligned annular substrate holders, or between an outer wall of an axial chain of substrate holder blocks and the inner wall of the tube. The substrate holders thus act as a liner, confining an arc within the plasma channel. Carrier and plasma-creating gases and the reaction species are introduced into the tube, and the deposition process may be carried out at a pressure between 100 Torr and 1000 Torr. Magnetic coils may be used to create a longitudinal magnetic field which focuses the plasma column created by the arc, and to create a transverse magnetic field which is used to bias the plasma column toward the substrates. Substrates can thus be placed anywhere within the reaction zone, and the transverse magnetic field can be used to direct the plasma column toward the substrate, or the tube itself can be rotated to pass the substrate through the plasma column. In multiple-arc embodiments a plurality of substrate holders defining a plurality of arc channels may be aligned coaxially or distributed transversely about the reaction zone.
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Eisen Mark B.
Pianalto Bernard
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