Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1994-06-13
1995-08-08
Chapman, Mark A.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
522 31, 522 86, 522166, 522170, G03C 1725
Patent
active
054397790
ABSTRACT:
The present invention provides a photoimageable soldermask that may be applied using aqueous solvents, thereby reducing the emission of organic solvents. The soldermask contains an epoxy based resin system comprised of at least one epoxy resin, a coating agent, and preferably a cationic photoinitiator and a dye.
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Day Richard A.
Gelorme Jeffrey D.
Glatzel Donald H.
Mertz John R.
Russell David J.
Chapman Mark A.
International Business Machines - Corporation
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