Aqueous photoresist waste treatment by acid/cupric chloride prec

Details Aqueous photoresist waste treatment by acid/cupric chloride prec Aqueous photoresist waste treatment by acid/cupric chloride prec

1991-11-26

1993-01-26

Bascomb, Jr., Wilbur

Liquid purification or separation

Processes

Making an insoluble substance or accreting suspended...

210908, C02F 152

Patent

active

051820293

ABSTRACT:
A process is disclosed for treating an aqueous waste stream containing a photoresist waste component. Under this process the pH of the waste stream is adjusted in a range from about 4.0 to about 6.0 and an additive is added to the waste stream in a concentration effective to separate a precipitant from the waste solution in the form of a non-sticky residue. The additive is selected from the group consisting of FeCl.sub.3, CuCl.sub.2, NH.sub.4 Cl, AlCl.sub.3, and combinations thereof.

REFERENCES:
patent: 4760014 (1988-07-01), Wong
patent: 4761239 (1988-08-01), Wardell
patent: 4857206 (1989-08-01), Choo
patent: 4999114 (1991-03-01), Choo

Affiliated with

Also associated with

Rating

Aqueous photoresist waste treatment by acid/cupric chloride prec does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Aqueous photoresist waste treatment by acid/cupric chloride prec, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Aqueous photoresist waste treatment by acid/cupric chloride prec will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1411156