Aqueous photoresist method

Details Aqueous photoresist method Aqueous photoresist method

1978-12-08

1980-12-02

Powell, William A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

1566591, 156902, 156904, 430435, 430643, C23F 102, G03C 500, G03C 524

Patent

active

042372100

ABSTRACT:
A process of producing a photoresist pattern on a circuit board including applying a casein based photoresist film of a thickness of at least 4.0 micrometers to a circuit board, air drying the film, exposing the dried film to actinic radiation through a photomask and developing the exposed photoresist film with soft water to wash away the unexposed areas of the film, thereby leaving an etch resistant pattern of photoresist on the circuit board.

REFERENCES:
patent: 4061529 (1977-12-01), Goldman et al.
patent: 4158566 (1979-06-01), Goldman
Photoresist Material and Processes by W. S. Deforest, 1975, chapter one, History of Photoresists, pp. 1-18.

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