Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making printing plates
Patent
1988-01-06
1989-05-09
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making printing plates
430325, 430331, G03C 518, G03C 500
Patent
active
048289655
ABSTRACT:
An aqueous developing solution useful in developing positive-working photoresists comprising:
REFERENCES:
patent: 4053314 (1977-10-01), Kimura et al.
patent: 4174304 (1979-11-01), Flangan
patent: 4191569 (1980-03-01), Lawson
patent: 4191573 (1980-03-01), Toyama et al.
patent: 4221858 (1980-09-01), Shiba et al.
patent: 4359520 (1982-11-01), Carothers et al.
patent: 4366224 (1982-12-01), Hsieh
patent: 4370404 (1983-01-01), Tachikawa et al.
patent: 4411981 (1983-10-01), Minezaki
patent: 4732840 (1988-03-01), Hasegawa
Marcotte, Jr. Stephen F.
Modawar Faris A.
West Richard J.
Doody Patrick A.
Michl Paul R.
Olin Hunt Specialty Products Inc.
Simons William A.
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