Aqueous developable photoresist containing weak alkali soluble o

Details Aqueous developable photoresist containing weak alkali soluble o Aqueous developable photoresist containing weak alkali soluble o

1989-09-13

1991-05-28

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430281, 430285, 430286, G03C 1725, G03C 173

Patent

active

050194836

ABSTRACT:
An aqueous alkali developable photoresist composition consists of (a) a carboxyl group-containing polymeric binder, (b) 1-15% by weight of a photoinitiator based on the binder, (c) 20-100% by weight based on the binder, of a photo reactive monomer or oligomer containing at least two ethylenically unsaturated double bonds, and (d) 0.05-5% by weight based on the binder of a weak alkali soluble or dispersible thiol compound represented by

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