Aqueous developable deep UV negative resist containing benzannel

Details Aqueous developable deep UV negative resist containing benzannel Aqueous developable deep UV negative resist containing benzannel

1989-04-24

1993-01-12

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430271, 430275, 430277, 430278, 522 52, 522 63, 522 68, 522166, G03C 1492, C08J 328

Patent

active

051789876

ABSTRACT:
A radiation-sensitive mixture useful as a negative-working photoresist composition comprising:

REFERENCES:
patent: 4343885 (1982-08-01), Reardon, Jr.
patent: 4649100 (1987-03-01), Leyrer et al.
patent: 4740450 (1988-04-01), Tamaoki et al.
patent: 4902683 (1990-02-01), Slater et al.
Chemical Abstract 106(10):76147f, Onishi et al., Photosensitive Compositions Jul. 12, 1991.
Chemical Abstract No. 108(7) 55225f, by McAuley, Iain; Krogh, Erik; and Wan, Peter from the Journal of American Chemical Society, 110(2), 600-2.
Abstract No. 77(14):92787c by Takacs, Mihaly; Kertesz, Piroska; Vegh, Antal; and Simonyi, Istvan from the Acta Pharmaceutical of Hungari, 42(4), 177-82.

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