Aqueous developable deep UV negative resist

Details Aqueous developable deep UV negative resist Aqueous developable deep UV negative resist

1992-11-23

1993-11-02

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430270, 430271, 430275, 430277, 430278, 522 52, 522 63, 522 68, 522166, G03C 1492

Patent

active

052582604

ABSTRACT:
A radiation-sensitive mixture useful as a negative-working photoresist composition comprising:

REFERENCES:
patent: 4343885 (1982-08-01), Reardon, Jr.
patent: 4649100 (1987-03-01), Leyrer et al.
patent: 4740450 (1988-04-01), Tamaoki et al.
patent: 4902603 (1990-02-01), Slater et al.
Chemical Abstract No. 108(7):55225f, by McAuley, Iain; Krogh, Erik; and Wan, Peter from the Journal of American Chemical Society, 110(2), 600-2.
Abstract No. 77(14):92787c by Takacs, Mihaly; Kertesz, Piroska; Vegh, Antal; and Simonyi, Istvan from the Acta Pharmaceutical of Hungari, 42(4), 177-82.
Chemical Abstract 106(10):76147f, Onishi et al., Photosensitive Compositions, Jul. 12, 1991.

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