Aqueous compositions for making ultrapure water used in microele

Details Aqueous compositions for making ultrapure water used in microele Aqueous compositions for making ultrapure water used in microele

1998-04-17

1999-10-26

McKane, Elizabeth

Chemical apparatus and process disinfecting, deodorizing, preser

Process disinfecting, preserving, deodorizing, or sterilizing

Using disinfecting or sterilizing substance

210900, A61L 218

Patent

active

059722932

ABSTRACT:
Compositions for making ultrapure water in microelectronic device fabrication processes comprise hydrogen peroxide, peracetic acid, and water. Methods of sterilizing ultrapure water delivery systems for use in microelectronic device fabrication processes comprise contacting ultrapure water delivery systems with water having temperatures ranging from about 26.degree. C. to about 40.degree. C.; and sterilizing the ultrapure water delivery systems with compositions comprising hydrogen peroxide, peracetic acid, and water. The ultrapure water delivery systems comprise water tanks, heat exchangers in fluid communication with the water tanks, ultraviolet sterilizers in fluid communication with the heat exchangers, OR-polishers in fluid communication with the ultraviolet sterilizers, MB-polishers in fluid communication with the OR-polishers, and ultrafilters in fluid communication with the OR-polishers. The compositions employed in the sterilizing step do not contact the OR-polishers and the MB-polishers.

REFERENCES:
patent: 5024766 (1991-06-01), Mahmud
patent: 5160429 (1992-11-01), Ohmi et al.
patent: 5259972 (1993-11-01), Miyamuru et al.
patent: 5279735 (1994-01-01), Cosentino et al.
patent: 5731275 (1998-03-01), Prevost et al.

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