Aqueous base developable negative resist compositions

Details Aqueous base developable negative resist compositions Aqueous base developable negative resist compositions

1989-09-25

1991-05-28

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430176, 430330, 522146, 522 19, 522 25, 522 28, 522 30, 522 31, 522 14, 522134, 522139, G03F 7004

Patent

active

050194810

ABSTRACT:
An aqueous base developable negative resist composition comprising a phenolic resin, a radio-chemical acid generator and a small molecule which upon irradication and postbake reacts with the phenolic resin to decrease its rate of dissolution.

REFERENCES:
patent: 3787302 (1974-01-01), Ijichi et al.
patent: 4102687 (1978-07-01), Crivello
patent: 4640937 (1987-02-01), Hanyuda

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