Aqueous alkaline soluble photopolymerizable material

Details Aqueous alkaline soluble photopolymerizable material Aqueous alkaline soluble photopolymerizable material

1979-06-18

1981-04-21

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

20415914, 20415922, 525301, 525327, 525386, G03C 168

Patent

active

042633940

ABSTRACT:
A photopolymerizable material suitable for use in the production of lithographic printing plates comprises a polymer which includes a plurality of structural units represented by the Formula: ##STR1## in which R.sup.1 represents a hydrogen atom or a methyl group; R.sup.2 represents a hydrogen atom, an alkyl or substituted alkyl group, an aryl or substituted aryl group, or a heterocyclic or substituted heterocyclic group; R.sup.3, R.sup.4 and R.sup.5, which may be the same or different, each represents a hydrogen atom, a halogen atom, a cyano group, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an aralkyl group, an aralkoxy group or an alkoxy carbonyl group; Z represents a hydroxyl group, or an ester group and a is an integer greater than or equal to 1. The polymer may be produced by reacting a polymer of 2,3-epoxy propyl acrylate or 2,3-epoxy propyl methacrylate with an acid of formula ##STR2##

REFERENCES:
patent: 3799915 (1974-03-01), Dunnauant et al.
patent: 3993684 (1976-11-01), Dunnauant et al.
patent: 4065430 (1977-12-01), Satomura

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