Aqueous alkaline developing solution

Details Aqueous alkaline developing solution Aqueous alkaline developing solution

1994-02-25

1996-07-02

Chu, John S. Y.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430165, 430167, 430302, 510176, 510206, G03F 732

Patent

active

055321160

ABSTRACT:
An aqueous alkaline developing solution comprises an alkali compound, water and an alkylnaphthalene sulfonate having the following formula: ##STR1## in which R represents an alkyl group of 3 to 5 carbon atoms and q is 0 or an integer of 1 to 3, in the amount of 1 to 20 weight %. The aqueous alkaline developing solution further contains an anionic surface active agent of the specific sulfonate compound having a naphthalene ring and a polypolyoxyethylene moiety, in the amount of 0.1 to 10 weight % and an nonionic surface active agent having a polyoxyethylene moiety and an aromatic ring in its structure in the amount of 0.03 to 3 weight %, or contains an anionic surface active agent of the specific sulfonate compound having the specific aralkyl-substituted benzene ring and a polypolyoxyethylene moiety.

REFERENCES:
patent: 4348954 (1982-09-01), Okishi
patent: 4374920 (1983-02-01), Wanat et al.
patent: 4820621 (1989-04-01), Tanka et al.
patent: 4959296 (1990-09-01), Yoshida et al.
patent: 5149614 (1992-09-01), Akiyama et al.
patent: 5246818 (1993-09-01), Liu
patent: 5316892 (1994-05-01), Walls et al.

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