Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1984-09-28
1985-12-31
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430910, 430271, 430281, 430285, 522121, G03C 168
Patent
active
045621420
ABSTRACT:
Photosensitive composition comprising (a) an addition polymerizable compound of the general formula: ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are hydrogen atom or methyl group, and n+m=8 to 12, (b) an addition-poymerizable compound of the general formula: ##STR2## wherein Z is a cyclic dibasic acid residue, R.sup.5 is a C.sub.1 to C.sub.3 alkylene group, R.sup.6 is hydrogen atom or methyl group, and R.sup.7 is hydrogen atom, methyl group, ethyl group or CH.sub.2 X in which X is chlorine atom or bromine atom, (c) a photoactivatable polymerization initiator, and (d) a linear copolymer having a carboxy content of 17 to 50% by mole, a water absorption of 4 to 30% by weight and a weight average molecular weight of 30,000 to 400,000. Photosensitive laminate having a photosensitive layer formed from the composition has an excellent resistance to plating liquids as well as excellent etching resistance, chemical resistance, adhesion property to boards and developing property.
REFERENCES:
patent: 4108666 (1978-08-01), Hayashi et al.
patent: 4245031 (1981-01-01), Chambers
patent: 4264708 (1981-04-01), Chambers
patent: 4291115 (1981-09-01), Chambers
Hayashi Nobuyuki
Kakumaru Hajime
Brammer Jack P.
Hitachi Chemical Company Ltd.
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