Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-02-25
2000-08-15
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430905, 430906, 430910, G03F 7004
Patent
active
061034479
ABSTRACT:
The present invention is directed to a high-performance irradiation sensitive positive-tone resist and to a method of formulating the same. In one aspect, the polymer resin composition of the present invention comprises a blend of at least two miscible aqueous base soluble polymer resins, wherein one of said aqueous base soluble polymer resins of said blend is partially protected with a high activation energy protecting group and the other aqueous base soluble polymer resin of said blend is partially protected with a low activation energy protecting group. A chemically amplified resist system comprising said polymer resin composition; at least one acid generator; and a solvent is also provided herein.
REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 5210000 (1993-05-01), Thackeray et al.
patent: 5252435 (1993-10-01), Tani et al.
patent: 5258257 (1993-11-01), Sinta et al.
patent: 5272042 (1993-12-01), Allen et al.
patent: 5352564 (1994-10-01), Takeda et al.
patent: 5372912 (1994-12-01), Allen et al.
patent: 5585218 (1996-12-01), Nakano et al.
patent: 5585220 (1996-12-01), Breyta et al.
patent: 5609989 (1997-03-01), Bantu et al.
patent: 5627010 (1997-05-01), Pai et al.
patent: 5731125 (1998-03-01), Yamachika et al.
patent: 5736296 (1998-04-01), Sato et al.
patent: 5741629 (1998-04-01), Chandross et al.
patent: 5744281 (1998-04-01), Niki et al.
patent: 5750309 (1998-05-01), Hatakeyama et al.
patent: 5837420 (1998-11-01), Aoai et al.
patent: 5874195 (1999-02-01), Sato et al.
patent: 5948589 (1999-09-01), Sato et al.
patent: 5955240 (1999-09-01), Sato et al.
Hattori et al., "Dissolution Inhibition of Phenolic Resins by Diazonaphthoquinone: Effect of Polymer Structure," Jpn. J. Appl. Phys. Part 1, vol. 30, No. 11B, pp. 3125-3131 (Nov. 1991).
127:115290C "Chemically amplification-type positive working resist composition" Photoresist News, Oct. 1996, vol. 55.
Chen Kuang-Jung
Dellaguardia Ronald A.
Huang Wu-Song
Katnani Ahmad D.
Khojasteh Mahmoud M.
Capella, Esq. Steven
Chu John S.
International Business Machines Corp.
LandOfFree
Approach to formulating irradiation sensitive positive resists does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Approach to formulating irradiation sensitive positive resists, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Approach to formulating irradiation sensitive positive resists will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2005008