Application of spectroscopic ellipsometry to in-situ real...

Details Application of spectroscopic ellipsometry to in-situ real... Application of spectroscopic ellipsometry to in-situ real...

2005-09-06

2005-09-06

Smith, Zandra V. (Department: 2877)

Optics: measuring and testing

By polarized light examination

Of surface reflection

Reexamination Certificate

active

06940595

ABSTRACT:
Disclosed is application of oblique angle of incidence, reflection and/or transmission mode spectroscopic ellipsometry PSI and/or DELTA, (including combinations thereof and/or mathematical equivalents), vs. wavelength data to monitor and/or control fabrication of multiple layer high/low refractive index band-pass, band-reject and varied attenuation vs. wavelength filters, either alone or in combination with transmissive non-ellipsometric electromagnetic beam turning point vs. layer data obtained at an essentially normal angle of incidence.

REFERENCES:
patent: 6636309 (2003-10-01), Johs et al.

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