Electric heating – Metal heating – By arc
Reexamination Certificate
2010-01-25
2011-12-20
Paschall, Mark (Department: 3742)
Electric heating
Metal heating
By arc
C219S121430, C219S121580, C156S345330, C156S345510
Reexamination Certificate
active
08080760
ABSTRACT:
A plasma processing chamber includes a cantilever assembly configured to neutralize atmospheric load. The chamber includes a wall surrounding an interior region and having an opening formed therein. A cantilever assembly includes a substrate support for supporting a substrate within the chamber. The cantilever assembly extends through the opening such that a portion is located outside the chamber. The chamber includes an actuation mechanism operative to move the cantilever assembly relative to the wall.
REFERENCES:
patent: 5820723 (1998-10-01), Benjamin et al.
patent: 5948704 (1999-09-01), Benjamin et al.
patent: 6019060 (2000-02-01), Lenz
patent: 6170428 (2001-01-01), Redeker et al.
patent: 6270618 (2001-08-01), Nakano et al.
patent: 6962664 (2005-11-01), Mitrovic
patent: 2003/0141017 (2003-07-01), Fujisato
patent: 2004/0182505 (2004-09-01), Sato
patent: 2005/0050327 (2005-03-01), Okamoto
patent: 2005/0051520 (2005-03-01), Tanaka
patent: 2008/0276958 (2008-11-01), Mehta et al.
patent: 2001-077088 (2001-03-01), None
patent: 2001-284332 (2001-10-01), None
patent: 10-0345420 (2002-11-01), None
patent: 10-2003-0051698 (2003-06-01), None
Official Action issued Apr. 14, 2010 for Chinese Appln. No. 200880002547.8.
International Search Report and Written Opinion mailed Jun. 4, 2008 for PCT/US2008/000001.
DeSepte Andy W.
Dhindsa Rajinder
Lenz Eric H.
Li Lumin
Buchanan Ingergoll & Rooney PC
Lam Research Corporation
Paschall Mark
LandOfFree
Apparatuses for adjusting electrode gap in... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatuses for adjusting electrode gap in..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatuses for adjusting electrode gap in... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4297463