Apparatuses for adjusting electrode gap in...

Electric heating – Metal heating – By arc

Reexamination Certificate

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Details

C219S121430, C219S121580, C156S345330, C156S345510

Reexamination Certificate

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07732728

ABSTRACT:
A plasma processing chamber includes a cantilever assembly configured to neutralize atmospheric load. The chamber includes a wall surrounding an interior region and having an opening formed therein. A cantilever assembly includes a substrate support for supporting a substrate within the chamber. The cantilever assembly extends through the opening such that a portion is located outside the chamber. The chamber includes an actuation mechanism operative to move the cantilever assembly relative to the wall.

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patent: 2004/0182515 (2004-09-01), Sato
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patent: 2001-77088 (2001-03-01), None
patent: 2001-284332 (2001-10-01), None
patent: 10-0345420 (2002-11-01), None
patent: 10-2003-0051698 (2003-06-01), None
International Search Report and Written Opinion dated Jun. 4, 2008 for PCT/US2008/000001.

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